公开(公告)号：US07186313B2

公开(公告)日：2007-03-06

申请号：US10765445

申请日：2004-01-28

申请人： Andrej S Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven T Fink ,  William D Jones

发明人： Andrej S Mitrovic ,  Maolin Long ,  Paul Moroz ,  Steven T Fink ,  William D Jones

IPC分类号： H01L21/306

CPC分类号： H01L21/67248 ,  G05D23/1934 ,  H01J37/32522 ,  H01L21/67069 ,  H01L21/67109

摘要： A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segments of the wall or other surfaces.

公开(公告)号：US07591923B2

公开(公告)日：2009-09-22

申请号：US11082223

申请日：2005-03-17

申请人： Andrej S Mitrovic ,  Audunn Ludviksson

发明人： Andrej S Mitrovic ,  Audunn Ludviksson

IPC分类号： G01L21/30

CPC分类号： H01J37/32935 ,  H01J37/32972

摘要： A plasma processing system and method for operating an optical system in conjunction with a plasma processing system are provided. The plasma processing system includes an optical system in communication with a plasma processing chamber of the plasma processing system. The optical system has a window and is constructed and arranged to detect a plasma process condition through the window and a transmission condition of the window. The method includes detecting an optical emission from the plasma processing region and monitoring contamination of a window provided by the optical system.

摘要翻译： 提供了一种与等离子体处理系统一起操作光学系统的等离子体处理系统和方法。 等离子体处理系统包括与等离子体处理系统的等离子体处理室连通的光学系统。 光学系统具有窗口，并被构造和布置成通过窗口和窗口的传输条件来检测等离子体处理条件。 该方法包括检测来自等离子体处理区域的光发射并监测由光学系统提供的窗口的污染。

公开(公告)号：US07208067B2

公开(公告)日：2007-04-24

申请号：US10807439

申请日：2004-03-24

申请人： Andrej S Mitrovic

发明人： Andrej S Mitrovic

IPC分类号： H01L21/00 ,  C23C16/00 ,  C23C14/00

CPC分类号： H01L21/67248 ,  H01L21/6831 ,  H01L21/6833 ,  Y10T279/23

摘要： A method and system for monitoring and/or controlling the conditions of a wafer on an electrostatic chuck during plasma processing. The method and system include utilizing backflow gas pressure and DC clamping voltage as control variables to adjust the wafer temperature based upon impedance measurements determined by RF sensors located in the electrostatic chuck RF feed line. The method and system further include utilizing the clamping status of the wafer on the electrostatic chuck to monitor impedance during the plasma process.

摘要翻译： 一种用于在等离子体处理期间监测和/或控制静电卡盘上的晶片的状态的方法和系统。 该方法和系统包括利用回流气体压力和直流钳位电压作为控制变量，以基于位于静电吸盘RF馈送线中的RF传感器确定的阻抗测量来调整晶片温度。 该方法和系统还包括利用静电卡盘上的晶片的夹紧状态来监测等离子体处理期间的阻抗。

公开(公告)号：US06899527B2

公开(公告)日：2005-05-31

申请号：US10739948

申请日：2003-12-19

申请人： Bill H Quon ,  Samuel S. Antley ,  Andrej S Mitrovic

发明人： Bill H Quon ,  Samuel S. Antley ,  Andrej S Mitrovic

IPC分类号： H01J37/32 ,  H05H1/54 ,  F04B37/02 ,  C23C16/00 ,  F04B23/00

CPC分类号： H01J27/143 ,  H01J37/3266 ,  H01J37/32834 ,  H05H1/54

摘要： A closed-drift Hall effect plasma vacuum pump includes one or more pumping conduits which are linked with a radial magnetic field. The magnetic field separates a plasma from a plasma at a higher pressure which is formed by cross-field plasma transport from a plasma processing region.

摘要翻译： 闭合漂移霍尔效应等离子体真空泵包括一个或多个与径向磁场相连的泵送管道。 磁场将等离子体从等离子体处理区域的交叉场等离子体传输形成的较高压力下分离出来。