公开(公告)号：US07840305B2

公开(公告)日：2010-11-23

申请号：US11427154

申请日：2006-06-28

申请人： Andrew H. Behr ,  Brian D. Goers ,  Vincent J. Laraia ,  Gary M. Palmgren ,  Daniel B. Pendergrass, Jr.

发明人： Andrew H. Behr ,  Brian D. Goers ,  Vincent J. Laraia ,  Gary M. Palmgren ,  Daniel B. Pendergrass, Jr.

IPC分类号： G06F19/00 ,  H01L21/00 ,  B24B49/00 ,  B24B21/18

CPC分类号： B24B53/017 ,  B24B37/04 ,  B24B49/02 ,  B24B49/04 ,  B24B49/14 ,  B24B49/16 ,  H01L2924/0002 ,  H01L2924/00

摘要： The disclosure relates to abrasive articles useful in chemical-mechanical polishing (CMP), the articles including a substrate with opposite major surfaces, an abrasive material overlaying at least a portion of at least one of the major surfaces, and at least one of a radio frequency identification (RFID) tag, a RFID tag reader, or a sensor for providing CMP information to a transmitter positioned near the substrate, the transmitter positioned near the substrate and adapted to wirelessly receive CMP information and wirelessly transmit the CMP information to a remote receiver. The disclosure also relates to a CMP pad conditioner for wirelessly communicating CMP information to a remote receiver, a CMP process monitoring system for wirelessly communicating CMP information to a remote receiver, and a method for conditioning a CMP pad using a CMP process monitoring system for wireless communicating CMP information to a remote receiver.

摘要翻译： 本公开涉及可用于化学机械抛光（CMP）的磨料制品，所述制品包括具有相反主表面的基底，覆盖至少一个主表面的至少一部分的研磨材料，以及至少一个无线电 频率识别（RFID）标签，RFID标签读取器或用于向位于衬底附近的发射器提供CMP信息的传感器，发射器位于衬底附近并适于无线地接收CMP信息并将CMP信息无线传输到远程接收器 。 本公开还涉及用于将CMP信息无线地传送到远程接收器的CMP垫调节器，用于将CMP信息无线传送到远程接收器的CMP处理监视系统，以及使用CMP无线通信的CMP处理监视系统来调节CMP垫的方法 将CMP信息传送到远程接收器。