Semiconductor device and method for producing a semiconductor device
    1.
    发明授权
    Semiconductor device and method for producing a semiconductor device 有权
    半导体装置及其制造方法

    公开(公告)号:US07939850B2

    公开(公告)日:2011-05-10

    申请号:US12403100

    申请日:2009-03-12

    IPC分类号: H01L29/74

    CPC分类号: H01L29/861 H01L29/0634

    摘要: A semiconductor device has a semiconductor body with a semiconductor device structure including at least a first electrode and a second electrode. Between the two electrodes, a drift region is arranged, the drift region including charge compensation zones and drift zones arranged substantially parallel to one another. At least one charge carrier storage region which is at least partially free of charge compensation zones is arranged in the semiconductor body.

    摘要翻译: 半导体器件具有半导体器件结构,半导体器件结构至少包括第一电极和第二电极。 在两个电极之间布置漂移区域,漂移区域包括电荷补偿区域和漂移区域彼此基本平行布置。 至少部分没有电荷补偿区域的至少一个电荷载体存储区域被布置在半导体本体中。

    Semiconductor device and method for producing a semiconductor device
    2.
    发明授权
    Semiconductor device and method for producing a semiconductor device 有权
    半导体装置及其制造方法

    公开(公告)号:US09070789B2

    公开(公告)日:2015-06-30

    申请号:US13048544

    申请日:2011-03-15

    CPC分类号: H01L29/861 H01L29/0634

    摘要: A semiconductor device has a semiconductor body with a semiconductor device structure including at least a first electrode and a second electrode. Between the two electrodes, a drift region is arranged, the drift region including charge compensation zones and drift zones arranged substantially parallel to one another. At least one charge carrier storage region which is at least partially free of charge compensation zones is arranged in the semiconductor body.

    摘要翻译: 半导体器件具有半导体器件结构,半导体器件结构至少包括第一电极和第二电极。 在两个电极之间布置漂移区域,漂移区域包括电荷补偿区域和漂移区域彼此基本平行布置。 至少部分没有电荷补偿区域的至少一个电荷载体存储区域被布置在半导体本体中。

    SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE
    3.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE 有权
    用于制造半导体器件的半导体器件和方法

    公开(公告)号:US20110165763A1

    公开(公告)日:2011-07-07

    申请号:US13048544

    申请日:2011-03-15

    IPC分类号: H01L21/225 H01L21/20

    CPC分类号: H01L29/861 H01L29/0634

    摘要: A semiconductor device has a semiconductor body with a semiconductor device structure including at least a first electrode and a second electrode. Between the two electrodes, a drift region is arranged, the drift region including charge compensation zones and drift zones arranged substantially parallel to one another. At least one charge carrier storage region which is at least partially free of charge compensation zones is arranged in the semiconductor body.

    摘要翻译: 半导体器件具有半导体器件结构,半导体器件结构至少包括第一电极和第二电极。 在两个电极之间布置漂移区域,漂移区域包括电荷补偿区域和漂移区域彼此基本平行布置。 至少部分没有电荷补偿区域的至少一个电荷载体存储区域被布置在半导体本体中。

    SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE
    4.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE 有权
    用于制造半导体器件的半导体器件和方法

    公开(公告)号:US20100230715A1

    公开(公告)日:2010-09-16

    申请号:US12403100

    申请日:2009-03-12

    CPC分类号: H01L29/861 H01L29/0634

    摘要: A semiconductor device has a semiconductor body with a semiconductor device structure including at least a first electrode and a second electrode. Between the two electrodes, a drift region is arranged, the drift region including charge compensation zones and drift zones arranged substantially parallel to one another. At least one charge carrier storage region which is at least partially free of charge compensation zones is arranged in the semiconductor body.

    摘要翻译: 半导体器件具有半导体器件结构,半导体器件结构至少包括第一电极和第二电极。 在两个电极之间布置漂移区域,漂移区域包括电荷补偿区域和漂移区域彼此基本平行布置。 至少部分没有电荷补偿区域的至少一个电荷载体存储区域被布置在半导体本体中。