公开(公告)号：US20190309418A1

公开(公告)日：2019-10-10

申请号：US16369974

申请日：2019-03-29

Applicant: Applied Materials, Inc.

Inventor： Akshay GUNAJI ,  Karthik JANAKIRAMAN ,  Madhukar Chandrakant GULEDGUDD ,  Akshay DHANAKSHIRUR

IPC: C23C16/455

Abstract: The present disclosure relates to a rotatable diffuser apparatus for use in semiconductor process chambers. The apparatus includes a diffuser plate having holes disposed in regions across the plate. A shaft disposed through a dynamic fluid seal allows the plate to be rotated while maintaining desired pressures inside the chamber. The plate may be rotated to align holes in the regions with holes disposed in a fixed blocker plate. By varying the amount of holes aligned or the degree of alignment in different regions of the diffuser, the radial distribution of process gases may be adjusted.

公开(公告)号：US20190311887A1

公开(公告)日：2019-10-10

申请号：US16369911

申请日：2019-03-29

Applicant: Applied Materials, Inc.

Inventor： Akshay GUNAJI ,  Tuan Anh NGUYEN ,  Mayur G. KULKARNI ,  Sanjeev BALUJA ,  Kurt LANGELAND

IPC: H01J37/32 ,  C23C16/455

Abstract: The present disclosure relates to a fluid delivery system assembly for use with a semiconductor process chamber. A series of three-way valves control process fluid flow between process fluid conduits which lead to the process chamber and a divert conduit.