-
公开(公告)号：US20220270883A1
公开(公告)日：2022-08-25
申请号：US17183474
申请日：2021-02-24
Applicant: Applied Materials, Inc.
Inventor： Kunal Bhatnagar , Dmitrii Leshchev , Mohith Verghese , Alex Romero
IPC: H01L21/285 , C23C16/14 , C23C16/455 , C23C16/44
Abstract: Methods for depositing molybdenum films on a substrate are described. The substrate is exposed to a molybdenum halide precursor and an aluminum precursor to form the molybdenum film (e.g., elemental molybdenum) at a low temperature. The exposures can be sequential or simultaneous.
Search Results
1
records
(took 0.01 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
