公开(公告)号：US20040229549A1

公开(公告)日：2004-11-18

申请号：US10428914

申请日：2003-05-02

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Polyak ,  Avi Tepman

IPC: B24B001/00 ,  B24B007/30

CPC classification number: B24B37/04 ,  B24B37/042 ,  B24B57/02

Abstract: A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the delivery arm is controllable.

Abstract translation: 已经提供了一种抛光流体输送装置，其在一个实施例中包括支撑构件，分配臂，抛光流体输送管和可变限制装置。 分配臂从支撑构件的上部延伸并且具有与其连接的输送管的出口。 限制装置与输送管接口并且适于对通过输送管的流动提供可变的限制。 在另一个实施例中，限制装置是夹管阀，并且管从出口连续到超过与夹紧阀相接合的部分。 在另一个实施例中，输送臂的位置是可控的。