公开(公告)号：US10037589B2

公开(公告)日：2018-07-31

申请号：US14203174

申请日：2014-03-10

Applicant: Applied Materials, Inc.

Inventor： Barry Keane ,  Thomas Laidig

IPC: G06T1/20 ,  G06T11/40 ,  G03F7/20

CPC classification number: G06T1/20 ,  G03F7/70425 ,  G06T11/40

Abstract: System and method for a parallel image processing mechanism for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the parallel image processing system includes a graphics engine configured to partition an object into a plurality of trapezoids and form an edge list for representing each of the plurality of trapezoids, and a distributor configured to receive the edge list from the graphics engine and distribute the edge list to a plurality of scan line image processing units. The system further includes a sentinel configured to synchronize operations of the plurality of scan line image processing units, and a plurality of buffers configured to store image data from corresponding scan line image processing units and outputs the stored image data using the sentinel.