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公开(公告)号：US09907152B2
公开(公告)日：2018-02-27
申请号：US15087173
申请日：2016-03-31
Applicant: Applied Materials, Inc.
Inventor： Jeffrey Kaskey , Thomas Laidig , David Markle , Jang Fung Chen
CPC classification number: H05B37/04 , G03F7/70575 , H05B37/03 , H05B37/032
Abstract: An illumination system and methods for controlling the illumination system are provided. In one embodiment, the method includes providing a plurality of illumination sources, monitoring optical output power of the plurality of illumination sources over a period of time, and controlling the plurality of illumination sources to maintain a predetermined level of optical output power. The method further includes compensating for degradations of one or more of the plurality of illumination sources to maintain the predetermined level of optical output power, predicting a lifetime of the illumination system based on the parameters of the plurality of illumination sources, and performing periodic maintenance of the plurality of illumination sources according to a quality control schedule.
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公开(公告)号：US10031427B2
公开(公告)日：2018-07-24
申请号：US14871066
申请日：2015-09-30
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , Jeffrey Kaskey , Thomas Laidig
Abstract: Systems and apparatus for performing photolithography processes are described. The system and apparatus may comprise a slab, at least one stage disposed on the slab, and a vibration damping system disposed on the slab, the vibration damping system comprising a weight that is substantially equal to a weight of one of the at least one stage and a substrate that moves simultaneously with movement of the one of the at least one stage.
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公开(公告)号：US09519226B2
公开(公告)日：2016-12-13
申请号：US14203168
申请日：2014-03-10
Applicant: Applied Materials, Inc.
Inventor： Jang Fung Chen , Thomas Laidig
CPC classification number: G03F7/70383 , G03F7/70275 , G03F7/70291 , G03F7/70508 , G03F7/70791
Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system comprises a plurality of spatial light modulator (SLM) imaging units, and a controller configured to control the plurality of SLM imaging units. Each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The controller synchronizes movements of the plurality of SLM imaging units with movement of a substrate in writing a mask data to the substrate in a lithography manufacturing process.
Abstract translation: 公开了在光刻制造工艺中将掩模数据图案应用于衬底的系统和方法。 在一个实施例中，并行成像写入器系统包括多个空间光调制器（SLM）成像单元，以及被配置为控制多个SLM成像单元的控制器。 多个SLM成像单元中的每一个包括一个或多个照明源，一个或多个对准源，一个或多个投影透镜，以及多个微反射镜，其配置成将来自一个或多个照明源的光投射到相应的一个或多个 投影镜头 控制器在光刻制造过程中使多个SLM成像单元的运动与基板的移动同步，从而将掩模数据写入基板。
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公开(公告)号：US09405203B2
公开(公告)日：2016-08-02
申请号：US14203371
申请日：2014-03-10
Applicant: Applied Materials, Inc.
Inventor： Jang Fung Chen , Thomas Laidig
IPC: G03F7/20
CPC classification number: G03F7/70275 , G03F7/2059 , G03F7/70291 , G03F7/704 , G03F7/70466 , G03F7/70508 , G03F7/70791
Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system, where the parallel imaging writer system includes a plurality of multiple charged-particle beam (MCB) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying one or more objects in an area of the substrate to be imaged by corresponding MCB imaging units, and performing multiple exposures to image the one or more objects in the area of the substrate by controlling the plurality of MCB imaging units to write the plurality of partitioned mask data patterns in parallel.
Abstract translation: 公开了在光刻制造工艺中将掩模数据图案应用于衬底的系统和方法。 在一个实施例中，该方法包括提供并行成像写入器系统，其中并行成像写入器系统包括布置在一个或多个并行阵列中的多个多个带电粒子束（MCB）成像单元，接收要写入的掩模数据模式 处理掩模数据图案以形成对应于基板的不同区域的多个划分的掩模数据图案，通过相应的MCB成像单元识别待成像的基板的区域中的一个或多个对象，并执行多次曝光 通过控制多个MCB成像单元并行地写入多个划分的掩模数据图案来对基板区域中的一个或多个对象进行成像。
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Patent Agency Ranking
公开(公告)号：US10036966B2
公开(公告)日：2018-07-31
申请号：US15364748
申请日：2016-11-30
Applicant: Applied Materials, Inc.
Inventor： Benjamin M. Johnston , John White , Thomas Laidig
CPC classification number: G03F7/70808 , G03F7/70775 , G03F7/708 , G03F7/70858 , G03F7/70866 , G03F7/70933 , G03F9/00 , G03F9/70 , G03F9/7049 , G03F9/7057 , G03F2009/005
Abstract: Embodiments of the present disclosure generally relate to systems and methods for performing photolithography processes. In one embodiment, laminar gas flow is provided inside a photolithography system during operation. With laminar gas flow instead of turbulent gas flow inside the system, accuracy of the measurement of the location of a substrate disposed inside the system is improved due to the improved signal integrity of interferometers.
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公开(公告)号：US09250509B2
公开(公告)日：2016-02-02
申请号：US13909076
申请日：2013-06-04
Applicant: Applied Materials, Inc.
Inventor： David Markle , Thomas Laidig , Jeffrey Kaskey , Jang Fung Chen
CPC classification number: G03F7/7015 , G03B27/42 , G03F7/70291
Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
Abstract translation: 公开了一种空间光调制器成像系统。 该系统包括：照明模块，被配置为提供表示由空间光调制器成像系统成像的数据图案的照明光;投影模块，被配置为将照明光投影到基板;以及照明投影光束分离器，其耦合在照明模块 以及所述投影模块，其中所述照明投影光束分离器被配置为沿着照明光轴接收照明光，并且沿着投影光轴传输接收到所述投影模块的照明光，并且其中所述照明光轴和所述投影光学 轴基本上彼此平行。
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公开(公告)号：US10409172B2
公开(公告)日：2019-09-10
申请号：US15412530
申请日：2017-01-23
Applicant: Applied Materials, Inc.
Inventor： David Markle , Thomas Laidig , Timothy N. Thomas
IPC: G03B27/52 , G03F7/20 , F21V8/00 , G02B7/04 , G02B27/00 , G02F1/13 , G02B7/36 , G02B5/04 , G02B26/08
Abstract: Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.
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公开(公告)号：US10037589B2
公开(公告)日：2018-07-31
申请号：US14203174
申请日：2014-03-10
Applicant: Applied Materials, Inc.
Inventor： Barry Keane , Thomas Laidig
CPC classification number: G06T1/20 , G03F7/70425 , G06T11/40
Abstract: System and method for a parallel image processing mechanism for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the parallel image processing system includes a graphics engine configured to partition an object into a plurality of trapezoids and form an edge list for representing each of the plurality of trapezoids, and a distributor configured to receive the edge list from the graphics engine and distribute the edge list to a plurality of scan line image processing units. The system further includes a sentinel configured to synchronize operations of the plurality of scan line image processing units, and a plurality of buffers configured to store image data from corresponding scan line image processing units and outputs the stored image data using the sentinel.
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公开(公告)号：US09733573B2
公开(公告)日：2017-08-15
申请号：US14993071
申请日：2016-01-11
Applicant: Applied Materials, Inc.
Inventor： David Markle , Thomas Laidig , Jeffrey Kaskey , Jang Fung Chen
CPC classification number: G03F7/7015 , G03B27/42 , G03F7/70291
Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
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