公开(公告)号：US20250140537A1

公开(公告)日：2025-05-01

申请号：US18538100

申请日：2023-12-13

Applicant: Applied Materials, Inc.

Inventor： Zaoyuan Ge ,  Manjunath Veerappa Chobari Patil ,  Pavan Kumar S M ,  Dinesh Babu ,  Nuo Wang ,  Kaili Yu ,  Xinyi Zhong ,  Bharati Neelamraju ,  Liangfa Hu ,  Neela Ayalasomayajula ,  Sungwon Ha ,  Prashant Kumar Kulshreshtha ,  Amit Bansal ,  Daemian Raj Benjamin Raj ,  Badri N. Ramamurthi ,  Travis Mazzy ,  Mohammed Salman Mohiuddin ,  Karthik Suresh Menon ,  Lihua Wu ,  Prasath Poomani

IPC: H01J37/32 ,  B08B5/00 ,  B08B9/00

Abstract: Semiconductor processing chambers and systems, as well as methods of cleaning such chambers and systems are provided. Processing chambers and systems include a chamber body that defines a processing region, a liner positioned within the chamber body that defines a liner volume, a faceplate positioned atop the liner, a substrate support disposed within the chamber body, and a cleaning gas source coupled with the liner volume through a cleaning gas plenum and one or more inlet apertures. Systems and chambers include where at least one of the one or more inlet apertures is disposed in the processing region between the faceplate and a bottom wall of the chamber body.