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公开(公告)号：US11482397B1
公开(公告)日：2022-10-25
申请号：US17338050
申请日：2021-06-03
Applicant: Applied Materials, Inc.
Inventor： Craig Richard Chaney , Frank Sinclair , Daniel R. Tieger
IPC: H01J37/00 , H01J37/08 , H01J9/02 , H01J37/317
Abstract: An ion source is provided. The ion source may include an ion source chamber, and a cathode disposed in the ion source chamber and configured to emit electrons to generate a plasma within the ion source chamber, the cathode comprising a refractory metal, wherein the refractory metal comprises a macrocrystalline structure.
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