公开(公告)号：US20230221658A1

公开(公告)日：2023-07-13

申请号：US18000035

申请日：2020-06-15

Applicant: Applied Materials, Inc.

Inventor： Ulrich MUELLER ,  David Arthur MARKLE ,  Stephen F. SPORER

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70508 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70791

Abstract: The present disclosure relates to apparatus and methods for performing maskless lithography processes. A substrate rocessing apparatus includes a slab with a plurality of guiderails coupled to and extending along the slab. A first shuttle is disposed on the plurality of guiderails, a second shuttle is disposed on the first shuttle, and a metrology bar is coupled to the second shuttle. The etrology bar includes a first plurality of sensors coupled to the metrology bar. A second plurality of sensors coupled to the metrology bar are disposed laterally inward of the first plurality of sensors.