公开(公告)号：US20240201605A1

公开(公告)日：2024-06-20

申请号：US18081751

申请日：2022-12-15

Applicant: Applied Materials, Inc.

Inventor： Ulrich MUELLER

IPC: G03F9/00

CPC classification number: G03F9/7023 ,  G03F9/7069 ,  G03F9/7084

Abstract: Aspects of the present disclosure generally relate to a digital lithography system and methods for alignment resolution with the digital lithography system. The digital lithography system includes a metrology system configured to improve overlay alignment for different layers of the lithography process. The metrology system includes an inline metrology system (IMS) in combination with an on tool metrology system (OTM), which enable substrate overlay alignment and die placement correction. The inline metrology system may be positioned on an inline metrology tool and the on tool metrology system is positioned on a digital lithography tool. The inline metrology system facilitates measurement of high-throughput measurement inline metrology data for marks such as die marks and global alignment marks for verification of process stability and die placement data for digital data correction. This inline metrology data can be compared with a design file to determine offsets for the digital data correction.

公开(公告)号：US20230221658A1

公开(公告)日：2023-07-13

申请号：US18000035

申请日：2020-06-15

Applicant: Applied Materials, Inc.

Inventor： Ulrich MUELLER ,  David Arthur MARKLE ,  Stephen F. SPORER

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70508 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70791

Abstract: The present disclosure relates to apparatus and methods for performing maskless lithography processes. A substrate rocessing apparatus includes a slab with a plurality of guiderails coupled to and extending along the slab. A first shuttle is disposed on the plurality of guiderails, a second shuttle is disposed on the first shuttle, and a metrology bar is coupled to the second shuttle. The etrology bar includes a first plurality of sensors coupled to the metrology bar. A second plurality of sensors coupled to the metrology bar are disposed laterally inward of the first plurality of sensors.

公开(公告)号：US20240045345A1

公开(公告)日：2024-02-08

申请号：US18255954

申请日：2021-12-30

Applicant: Applied Materials, Inc.

Inventor： Ulrich MUELLER

IPC: G03F7/00

CPC classification number: G03F7/70758 ,  G03F7/70725 ,  G03F7/70775 ,  H02K41/031

Abstract: Embodiments of the present disclosure relate to a linear motor system and a digital lithography system having the linear motor system that compensates for potential parasitic forces applied to at least one stage of the digital lithography system during operation. The digital lithography system includes one or more motor coils disposed between an upper plate and a lower plate of a yoke of at least one track. The motor coils are each coupled to a mount which is coupled to a stage. Each mount includes one or more active compensators. During a digital lithography operation, the active compensators are in communication with the controller, The active compensators provides a force in the opposite direction of the parasitic forces, such as vibrations and other disturbances. The compensation of the parasitic forces increases the quality of the patterns printed by the digital lithography system.

公开(公告)号：US20230296907A1

公开(公告)日：2023-09-21

申请号：US17919017

申请日：2021-01-20

Applicant: Applied Materials, Inc.

Inventor： Ulrich MUELLER ,  David MARKLE

IPC: G02B27/09 ,  G02B27/28 ,  G02B26/08

CPC classification number: G02B27/0927 ,  G02B26/0816 ,  G02B27/283

Abstract: The present disclosure provides an apparatus and method for fabricating optical devices. The apparatus includes a support table having process chambers and a laser used to direct a beam along a propagation path to each of the process chambers. A central mirror is centrally disposed among the process chambers and is rotatable to reflect the beam to each of the process chambers for processing. A beam splitter is disposed within each of process chambers, each beam splitter is used to receive beams from the central mirror and emits a first beam in a first direction and a second beam in a second direction. A first mirror directs the first beam to a device and a second mirror directs the second beam to the device. Each of the first and second mirror is rotatable in at least three axes.