公开(公告)号：US11886111B2

公开(公告)日：2024-01-30

申请号：US17655583

申请日：2022-03-21

Applicant: Applied Materials, Inc.

Inventor： David Sell ,  Samarth Bhargava

IPC: G03F7/00 ,  G02B25/00

CPC classification number: G03F7/0005 ,  G02B25/001

Abstract: Embodiments of the present disclosure generally relate to methods of forming a substrate having a target thickness distribution at one or more eyepiece areas across a substrate. The substrate includes eyepiece areas corresponding to areas where optical device eyepieces are to be formed on the substrate. Each eyepiece area includes a target thickness distribution. A base substrate thickness distribution of a base substrate is measured such that a target thickness change can be determined. The methods described herein are utilized along with the target thickness change to form a substrate with the target thickness distribution.

公开(公告)号：US11720016B2

公开(公告)日：2023-08-08

申请号：US17315613

申请日：2021-05-10

Applicant: Applied Materials, Inc.

Inventor： David Sell ,  Samarth Bhargava

IPC: G03F7/00 ,  G02B25/00

CPC classification number: G03F7/0005 ,  G02B25/001

Abstract: Embodiments of the present disclosure generally relate to methods of forming a substrate having a target thickness distribution at one or more eyepiece areas across a substrate. The substrate includes eyepiece areas corresponding to areas where optical device eyepieces are to be formed on the substrate. Each eyepiece area includes a target thickness distribution. A base substrate thickness distribution of a base substrate is measured such that a target thickness change can be determined. The methods described herein are utilized along with the target thickness change to form a substrate with the target thickness distribution.

公开(公告)号：US20210382212A1

公开(公告)日：2021-12-09

申请号：US17329955

申请日：2021-05-25

Applicant: Applied Materials, Inc.

Inventor： David Sell ,  Brian Alexander Cohen

IPC: G02B5/18

Abstract: Embodiments described herein relate to gradient encapsulation of waveguide outcoupler gratings for control of diffraction efficiency and directionality. A device includes a first grating formed over a substrate, the first grating having a plurality of first structures extending away from the substrate, the first grating corresponding to an outcoupler. The device includes a first encapsulant disposed in one or more gaps formed between adjacent first structures, where a fill ratio of the first encapsulant decreases along the first grating. Also described herein are methods for fabricating the device.