RTP LAMP BASE IMPROVEMENT
    1.
    发明申请
    RTP LAMP BASE IMPROVEMENT 有权
    RTP灯泡改进

    公开(公告)号:US20150189697A1

    公开(公告)日:2015-07-02

    申请号:US14252430

    申请日:2014-04-14

    CPC classification number: H05B3/0047

    Abstract: A lamp device for thermal processing of a substrate is provided. The lamp device includes a bulb enclosing a filament, the filament having a pair of leads. The lamp device further includes a lamp base. The lamp base includes a seal connecting the bulb to the lamp base; a sleeve having one or more walls and two ends with one end surrounding the seal; a potting compound filling the sleeve; one or more wires distributed through the sleeve and the potting compound and coupled to the pair of leads; and one or more hookable features located within 10 mm of the sealing end.

    Abstract translation: 提供了一种用于基板的热处理的灯装置。 灯装置包括封装灯丝的灯泡,灯丝具有一对引线。 灯装置还包括灯座。 灯座包括将灯泡连接到灯座的密封件; 套筒具有一个或多个壁和两端,一端围绕密封; 填充套筒的灌封料; 一根或多根电线通过套管和封装化合物分布并耦合到一对引线上; 以及位于密封端10mm内的一个或多个可钩形特征。

    SEMICONDUCTOR PROCESSING CHAMBER
    2.
    发明申请

    公开(公告)号:US20170294325A1

    公开(公告)日:2017-10-12

    申请号:US15417865

    申请日:2017-01-27

    Abstract: A semiconductor processing apparatus is described that has a body with a wall defining two processing chambers within the body; a passage through the wall forming a fluid coupling between the two processing chambers; a lid removably coupled to the body, the lid having a portal in fluid communication with the passage; a gas activator coupled to the lid outside the processing chambers, the gas activator having an outlet in fluid communication with the portal of the lid; a substrate support disposed in each processing chamber, each substrate support having at least two heating zones, each with an embedded heating element; a gas distributor coupled to the lid facing each substrate support; and a thermal control member coupled to the lid at an edge of each gas distributor.

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