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公开(公告)号：US20230083497A1
公开(公告)日：2023-03-16
申请号：US17476200
申请日：2021-09-15
Applicant: Applied Materials, Inc.
Inventor： Alexandre Likhanskii , Peter F. Kurunczi , Ernest E. Allen
IPC: H01J37/32
Abstract: An ion source. The ion source may include a plasma chamber to house a plasma, and an extraction assembly, disposed along a side of the plasma chamber, and comprising at least one extraction aperture. The ion source may further include an antenna assembly, extending through the plasma chamber, along a first axis. The antenna assembly may include a dielectric enclosure, a plurality of conductive antennae, extending along the first axis within the dielectric enclosure.
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