公开(公告)号：US20250117002A1

公开(公告)日：2025-04-10

申请号：US18481171

申请日：2023-10-04

Applicant: Applied Materials, Inc.

Inventor： Geethanzali Kamalanathan ,  Vivek Bharat Shah ,  John Poulose ,  Ghadeh Hadi

IPC: G05B19/418

Abstract: A method includes identifying a target substrate process operation start time. The start time corresponds to a time of initiation of one or more substrate process actions. The method further includes providing to a model first one or more parameters of a gas transfer system associated with the substrate process operation. The method further includes obtaining first output from the model. The first output includes an indication of a first preemptive time period for initiation of first one or more gas delivery actions. The method further includes updating a process recipe. The process recipe is updated in accordance with the first preemptive time period. Updating the process recipe is to cause the first one or more gas delivery actions to deliver a first process gas to a process chamber within a threshold time window of the substrate process operation start time.

公开(公告)号：US20240371617A1

公开(公告)日：2024-11-07

申请号：US18142546

申请日：2023-05-02

Applicant: Applied Materials, Inc.

Inventor： Jeremy Smith ,  Tao Zhang ,  Vivek Bharat Shah ,  John Poulose ,  Ghadeh Hadi

IPC: H01J37/32

Abstract: A method includes obtaining, by a processing device, a measurement of a calibrated feedback control device of a process chamber. The method further includes determining, by the processing device, a first indication of performance of a plasma generating apparatus of the process chamber based on the measurement of the calibrated feedback control device. The method further includes obtaining, from a first sensor of the process chamber, a second indication of performance of the plasma generating apparatus. The method further include providing the first indication of performance of the plasma generating apparatus and the second indication of performance of the plasma generating apparatus to a plasma monitoring module. The method further includes obtaining, from the plasma monitoring module, a combined indication of performance of the plasma generating apparatus. The method further includes performing, in view of the combined indication of performance of the plasma generating apparatus, a corrective action.