公开(公告)号：US20240371617A1

公开(公告)日：2024-11-07

申请号：US18142546

申请日：2023-05-02

Applicant: Applied Materials, Inc.

Inventor： Jeremy Smith ,  Tao Zhang ,  Vivek Bharat Shah ,  John Poulose ,  Ghadeh Hadi

IPC: H01J37/32

Abstract: A method includes obtaining, by a processing device, a measurement of a calibrated feedback control device of a process chamber. The method further includes determining, by the processing device, a first indication of performance of a plasma generating apparatus of the process chamber based on the measurement of the calibrated feedback control device. The method further includes obtaining, from a first sensor of the process chamber, a second indication of performance of the plasma generating apparatus. The method further include providing the first indication of performance of the plasma generating apparatus and the second indication of performance of the plasma generating apparatus to a plasma monitoring module. The method further includes obtaining, from the plasma monitoring module, a combined indication of performance of the plasma generating apparatus. The method further includes performing, in view of the combined indication of performance of the plasma generating apparatus, a corrective action.