公开(公告)号：US11467499B2

公开(公告)日：2022-10-11

申请号：US16893538

申请日：2020-06-05

Applicant: Applied Materials, Inc.

Inventor： Wen Xiao ,  Vibhu Jindal ,  Huajun Liu ,  Herng Yau Yoong

IPC: G01N21/41 ,  G03F7/20 ,  G03F1/22 ,  G03F1/54 ,  G03F1/26 ,  G01J1/42 ,  G01N21/33

Abstract: Apparatus, methods and are disclosed for measuring refractive index of an absorber material used in EUV phase shift masks. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of EUV wavelengths and thickness values for the absorber material to determine the refractive index of the absorber material.

公开(公告)号：US20210382398A1

公开(公告)日：2021-12-09

申请号：US16893538

申请日：2020-06-05

Applicant: Applied Materials, Inc.

Inventor： Wen Xiao ,  Vibhu Jindal ,  Huajun Liu ,  Herng Yau Yoong

IPC: G03F7/20 ,  G03F1/22 ,  G03F1/54 ,  G03F1/00

Abstract: Apparatus, methods and are disclosed for measuring refractive index of an absorber material used in EUV phase shift masks. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of EUV wavelengths and thickness values for the absorber material to determine the refractive index of the absorber material.

公开(公告)号：US20210381967A1

公开(公告)日：2021-12-09

申请号：US16893547

申请日：2020-06-05

Applicant: Applied Materials, Inc.

Inventor： Wen Xiao ,  Vibhu Jindal ,  Huajun Liu ,  Herng Yau Yoong

IPC: G01N21/41 ,  G02B5/18

Abstract: Apparatus, methods and are disclosed for measuring refractive index of a material film. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of wavelengths and thickness values for the material film to determine the refractive index of the material film.

公开(公告)号：US11366059B2

公开(公告)日：2022-06-21

申请号：US16893547

申请日：2020-06-05

Applicant: Applied Materials, Inc.

Inventor： Wen Xiao ,  Vibhu Jindal ,  Huajun Liu ,  Herng Yau Yoong

IPC: G01N21/41 ,  G02B5/18

Abstract: Apparatus, methods and are disclosed for measuring refractive index of a material film. The method and apparatus utilize a reference measurement and as series of reflectance measurements at a range of wavelengths and thickness values for the material film to determine the refractive index of the material film.