公开(公告)号：US20250037974A1

公开(公告)日：2025-01-30

申请号：US18227226

申请日：2023-07-27

Applicant: Applied Materials, Inc.

Inventor： Dmitry LUBOMIRSKY ,  Junghoon KIM ,  Hyun Joo LEE ,  Pranav Vijay GADRE ,  Adib KHAN ,  Nithin Thomas ALEX ,  Douglas A. BUCHBERGER, Jr. ,  Qiwei LIANG ,  Ellie Y. YIEH ,  Shekhar ATHANI

IPC: H01J37/32

Abstract: Disclosed herein is a processing system. The processing system has an upper chamber body and a lower chamber body defining a processing environment. An upper heater is moveably disposed in the upper chamber body. The upper heater has a moveable support and an upper step formed along an outer perimeter. A lower showerhead is fixedly disposed in the lower chamber body. The lower showerhead includes a top surface configured to support a substrate, a lower step disposed along an outer perimeter wherein the substrate is configured to extend from the top surface partially over the lower step. Lift pins are disposed in the lower showerhead and configured to extend through the top surface and support the substrate thereon. Gas holes are disposed in a first zone along the top surface and a second zone on the step and configured to independently flow both a process and non-process gas.