公开(公告)号：US20220283029A1

公开(公告)日：2022-09-08

申请号：US17630235

申请日：2020-07-08

Applicant: Applied Materials, Inc.

Inventor： Zuoming ZHU ,  Martin A. HILKENE ,  Avinash SHERVEGAR ,  Surendra Singh SRIVASTAVA ,  Ala MORADIAN ,  Shu-Kwan LAU ,  Zhiyuan YE ,  Enle CHOO ,  Flora Fong-Song CHANG ,  Bindusugar MARATH SANKARATHODI ,  Patricia M. LIU ,  Errol Antonio C. SANCHEZ ,  Jenny LIN ,  Nyi O. MYO ,  Schubert S. CHU

IPC: G01J3/443 ,  C23C16/455

Abstract: One or more embodiments herein relate to methods for detection using optical emission spectroscopy. In these embodiments, an optical signal is delivered from the process chamber to an optical emission spectrometer (OES). The OES identifies emission peaks of photons, which corresponds to the optical intensity of radiation from the photons, to determine the concentrations of each of the precursor gases and reaction products. The OES sends input signals of the data results to a controller. The controller can adjust process variables within the process chamber in real time during deposition based on the comparison. In other embodiments, the controller can automatically trigger a process chamber clean based on a comparison of input signals of process chamber residues received before the deposition process and input signals of process chamber residues received after the deposition process.