公开(公告)号：US20230042334A1

公开(公告)日：2023-02-09

申请号：US17792667

申请日：2020-02-18

Applicant: Applied Materials, Inc.

Inventor： Chung-Shin KANG ,  Jun YANG ,  Hongbin JI

IPC: G03F7/20

Abstract: In embodiments of a digital lithography system, physical design data prepared at a data prep server in a hierarchical data structure. A leaf node comprises a repeater nod, comprising a bitmap image and a plurality of locations at which the bitmap appears in a physical design. At an EYE server, a repeater node bitmap is adjusted based upon, for example, spatial light modulator rotational adjustment and substrate distortion. The adjusted repeater node and the plurality of locations in which the adjusted repeater appears is compared to the repeater of the data prep server and its plurality of locations. In further embodiments, a rasterizer generates a checksum of bitmap to be printed to a substrate, from the EYE server bitmap. The checksum is compared to a checksum of the EYE server bitmap.

公开(公告)号：US20160284044A1

公开(公告)日：2016-09-29

申请号：US15078444

申请日：2016-03-23

Applicant: Applied Materials, Inc.

Inventor： Thomas L. LAIDIG ,  Jun YANG

IPC: G06T1/20 ,  G06T1/60

CPC classification number: G06T1/20

Abstract: A low-latency high bandwidth data path software application relating to the ability to apply maskless lithography patterns to a substrate in a manufacturing process is disclosed. The application processes graphical objects and configures the graphical objects for partition into a plurality of trapezoids. A tessellation of the graphical objects to trapezoids may simplify the rasterization stage. The application may use caching and parallel computation to compute rasterized images of the trapezoids quickly. Additionally, low-latency may allow for the correction of stage imperfections.

Abstract translation: 公开了一种涉及在制造过程中将无掩模光刻图案应用于基板的能力的低延迟高带宽数据路径软件应用。 应用程序处理图形对象并将分区的图形对象配置为多个梯形。 图形对象到梯形的细分可以简化光栅化阶段。 应用程序可以使用缓存和并行计算来快速计算梯形图的光栅化图像。 此外，低等待时间可能允许校正舞台瑕疵。

公开(公告)号：US20240152061A1

公开(公告)日：2024-05-09

申请号：US18415430

申请日：2024-01-17

Applicant: Applied Materials, Inc.

Inventor： Chung-Shin KANG ,  Jun YANG ,  Hongbin JI

IPC: G03F7/00

CPC classification number: G03F7/70508 ,  G03F7/70291 ,  G03F7/704

Abstract: In embodiments of a digital lithography system, physical design data prepared at a data prep server in a hierarchical data structure. A leaf node comprises a repeater nod, comprising a bitmap image and a plurality of locations at which the bitmap appears in a physical design. At an EYE server, a repeater node bitmap is adjusted based upon, for example, spatial light modulator rotational adjustment and substrate distortion. The adjusted repeater node and the plurality of locations in which the adjusted repeater appears is compared to the repeater of the data prep server and its plurality of locations. In further embodiments, a rasterizer generates a checksum of bitmap to be printed to a substrate, from the EYE server bitmap. The checksum is compared to a checksum of the EYE server bitmap.