PROTECTIVE YTTRIA COATING FOR SEMICONDUCTOR EQUIPMENT PARTS

    公开(公告)号:US20190264314A1

    公开(公告)日:2019-08-29

    申请号:US16274141

    申请日:2019-02-12

    Abstract: Disclosed herein is a poly-crystalline protective coating on a surface of a chamber component. The poly-crystalline protective coating may be deposited by thermal spraying and may comprise cubic yttria and monoclinic yttria. At least one of: (1) the ratio of the cubic yttria to monoclinic yttria, (2) the crystallite size of at least one of the cubic yttria or the monoclinic yttria, (3) the atomic ratio of oxygen (O) to yttria (Y), and/or (4) the dielectric properties of the poly-crystalline protective coating may be controlled to obtain consistent chamber performance when switching coated chamber components within a chamber of interest.

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