公开(公告)号：US20250092559A1

公开(公告)日：2025-03-20

申请号：US18970445

申请日：2024-12-05

Applicant: Applied Materials, Inc.

Inventor： Kwan Wook ROH ,  Xundong DAI ,  Keith Edward YPMA ,  Scott A. WEHRMANN

IPC: C25D21/14 ,  C25D3/38 ,  C25D7/12 ,  C25D17/00 ,  C25D21/02

Abstract: Electrochemical deposition systems and methods are described that have enhanced crystallization prevention features. The systems may include a bath vessel operable to hold an electrochemical deposition fluid having a metal salt dissolved in water. The systems may also include sensors including a thermometer and concentration sensor operable to measure characteristics of the electrochemical deposition fluid. The systems further include a computer configured to perform operations that include receiving system data from the electrochemical system and generating a control signal to change a characteristic of the electrochemical deposition fluid to prevent crystallization of a metal salt in the fluid. The computer generates the control signal based on processing that may include comparing an actual metal salt concentration in the electrochemical deposition fluid to a theoretical solubility limit for the metal salt in the fluid.