公开(公告)号：US20240274464A1

公开(公告)日：2024-08-15

申请号：US18108272

申请日：2023-02-10

Applicant: Applied Materials, Inc.

Inventor： Matthew Gabriel GOODMAN ,  John TOLLE ,  Shawn THOMAS ,  Lori D. WASHINGTON ,  Xinning LUAN ,  Zhepeng CONG

IPC: H01L21/687

CPC classification number: H01L21/68757 ,  H01L21/68785

Abstract: A susceptor for processing a substrate is provided including a base and a coating formed over the base. The base includes an outer rim having an inner edge, an outer edge, and a top connecting the inner edge to the outer edge; and an inner dish disposed inside the outer rim and coupled to the outer rim, the inner dish recessed from the top of the outer rim, the inner dish having a front side and an opposing back side. The coating has an outer surface that includes a first portion formed over the front side of the inner dish. The first portion of the outer surface of the coating includes a first region and a second region, the first region has a first average level of roughness, the second region has a second average level of roughness.