公开(公告)号：US20230077652A1

公开(公告)日：2023-03-16

申请号：US17903847

申请日：2022-09-06

Applicant: Applied Materials, Inc.

Inventor： Milan SIRY ,  Michael LIANG ,  Jeffrey A. KHO ,  Kwang Soo HUH

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/56

Abstract: Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas. The gas flow inlet guide having a flow guide bottom plate having an opening. A top plate is disposed over the flow guide bottom plate and a plasma blocker is disposed over the opening. The plasma blocker includes one or more apertures sized based one or more of a plasma density, an electron temperature, an ion temperature, or a characteristic of a process gas.