公开(公告)号：US11810754B2

公开(公告)日：2023-11-07

申请号：US17546667

申请日：2021-12-09

Applicant: Applied Materials, Inc.

Inventor： Eric D. Hermanson ,  Nevin Clay ,  Antonella Cucchetti ,  Philip Layne ,  Sudhakar Mahalingam ,  Michael Simmons

IPC: H01J37/304

CPC classification number: H01J37/3045 ,  H01J2237/2446 ,  H01J2237/24578

Abstract: A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a calibration sensor disposed in the beam line after the mass analyzer. The calibration sensor is able to measure both the total current of the ribbon ion beam, as well as provide information about its vertical position. Information from the calibration sensor can then be utilized by a controller to adjust various parameters to improve the density as well as the vertical position. In some embodiments, the calibration sensor may include a plurality of Faraday sensors, where, both the total current and the vertical position of the ion beam can be determined. Furthermore, the focus of the ion beam can be estimated based on the distribution of the current in the height direction.

公开(公告)号：US20230187171A1

公开(公告)日：2023-06-15

申请号：US17546667

申请日：2021-12-09

Applicant: Applied Materials, Inc.

Inventor： Eric D. Hermanson ,  Nevin Clay ,  Antonella Cucchetti ,  Philip Layne ,  Sudhakar Mahalingam ,  Michael Simmons

IPC: H01J37/304

CPC classification number: H01J37/3045 ,  H01J2237/2446 ,  H01J2237/24578

Abstract: A system and method for optimizing a ribbon ion beam in a beam line implantation system is disclosed. The system includes a calibration sensor disposed in the beam line after the mass analyzer. The calibration sensor is able to measure both the total current of the ribbon ion beam, as well as provide information about its vertical position. Information from the calibration sensor can then be utilized by a controller to adjust various parameters to improve the density as well as the vertical position. In some embodiments, the calibration sensor may include a plurality of Faraday sensors, where, both the total current and the vertical position of the ion beam can be determined. Furthermore, the focus of the ion beam can be estimated based on the distribution of the current in the height direction.