公开(公告)号：US20250029862A1

公开(公告)日：2025-01-23

申请号：US18223690

申请日：2023-07-19

Applicant: Applied Materials, Inc.

Inventor： Trung H. DAO ,  Sagir Bipin KADIWALA ,  Sam KIM ,  Minh Quoc TRAN ,  Gu LIU

IPC: H01L21/68 ,  B25J9/16 ,  G01B11/14 ,  G06T7/80

Abstract: Methods, systems, and apparatus for measuring a gap between a support surface for a substrate and an opposing upper surface of a processing chamber. The methods comprise: disposing a sensor substrate at a location spaced between the support surface and the upper surface, the sensor substrate comprising a body having a first side and a second side opposite the first side, the first side facing the support surface and the second side facing the upper surface, the first side having a first sensor and the second side having a second sensor; measuring, using the first sensor, a first distance between the first side and the support surface; measuring, using the second sensor, a second distance between the second side and the upper surface; and determining a gap between the support surface and the upper surface using the first distance and the second distance.