公开(公告)号：US20250029862A1

公开(公告)日：2025-01-23

申请号：US18223690

申请日：2023-07-19

Applicant: Applied Materials, Inc.

Inventor： Trung H. DAO ,  Sagir Bipin KADIWALA ,  Sam KIM ,  Minh Quoc TRAN ,  Gu LIU

IPC: H01L21/68 ,  B25J9/16 ,  G01B11/14 ,  G06T7/80

Abstract: Methods, systems, and apparatus for measuring a gap between a support surface for a substrate and an opposing upper surface of a processing chamber. The methods comprise: disposing a sensor substrate at a location spaced between the support surface and the upper surface, the sensor substrate comprising a body having a first side and a second side opposite the first side, the first side facing the support surface and the second side facing the upper surface, the first side having a first sensor and the second side having a second sensor; measuring, using the first sensor, a first distance between the first side and the support surface; measuring, using the second sensor, a second distance between the second side and the upper surface; and determining a gap between the support surface and the upper surface using the first distance and the second distance.

公开(公告)号：US20230378006A1

公开(公告)日：2023-11-23

申请号：US17751511

申请日：2022-05-23

Applicant: Applied Materials, Inc.

Inventor： Shuran SHENG ,  Eric HOLLAR ,  Sock Hoon LIM ,  Yu YANG ,  Ralph P. ANTONIO ,  Gu LIU

IPC: H01L21/66 ,  H01L21/02 ,  G01N21/95 ,  G01J3/44

CPC classification number: H01L22/34 ,  H01L22/12 ,  H01L21/02041 ,  G01N21/9501 ,  G01J3/44 ,  G06N20/00

Abstract: Methods and systems for monitoring wafer processing results continuously and in real-time. In some embodiments, a system may comprise at least one non-active chamber with at least one feedthrough access port which is configured to interact with a metrology apparatus. The feedthrough access port has a surface exposed to an inner volume of the non-active chamber and has a fluorine-based coating covering the surface. The non-active chamber has a wafer access port to one or more other chambers. The metrology apparatus is positioned external to the non-active chamber and is oriented to detect metrology data through one of the feedthrough access ports. A data collection apparatus is connected to the metrology apparatus and configured to continuously receive data from the metrology apparatus.