公开(公告)号：US20200232088A1

公开(公告)日：2020-07-23

申请号：US15758837

申请日：2016-04-28

申请人： Applied Materials, Inc.

发明人： John M. WHITE ,  Oliver GRAW

IPC分类号： C23C14/35 ,  C23C14/24 ,  C23C14/34 ,  C23C14/56 ,  C23C16/54 ,  C23C14/50 ,  H01J37/34 ,  H01J37/32

摘要： The present disclosure provides an apparatus for vacuum deposition on a substrate. The apparatus includes a vacuum chamber having a first area and a first deposition area, one or more deposition sources at the first deposition area, wherein the one or more deposition sources are configured for vacuum deposition on at least a first substrate while the at least a first substrate is transported along a first transport direction past the one or more deposition sources, and a first substrate transport unit in the first area, wherein the first substrate transport unit is configured for moving the at least a first substrate within the first area in a first track switch direction, which is different from the first transport direction.