公开(公告)号：US20230294116A1

公开(公告)日：2023-09-21

申请号：US17699971

申请日：2022-03-21

Applicant: Applied Materials, Inc.

Inventor： Prahallad Iyengar ,  Dhritiman Subha Kashyap ,  Parth Swaroop ,  Satish Radhakrishnan

IPC: B05B7/00 ,  B05B1/18

CPC classification number: B05B7/00 ,  B05B1/185

Abstract: Dual channel showerhead assemblies are described. In some embodiments, the dual channel showerhead assemblies, which include a showerhead upper plate and a showerhead lower plate, enable delivery of mutually incompatible precursors along separate channels that mix in the process zone above a wafer. The dual channel showerhead assemblies provide at least two separate gas paths. In some embodiments, the hole design and hole distribution are configured for minimal jetting effect and plenum volumes for fast purging. The dual channel showerhead assemblies described herein may have a reduced purge out time compared to single channel showerheads, spiral dual channel showerheads, and bonded dual channel showerheads.