公开(公告)号：USD1066275S1

公开(公告)日：2025-03-11

申请号：US29833394

申请日：2022-04-04

Applicant: Applied Materials, Inc.

Designer： Rohan Vijay Rane ,  Xue Yang Chang ,  Timothy Joseph Franklin ,  Daniel Sang Byun

公开(公告)号：USD1049067S1

公开(公告)日：2024-10-29

申请号：US29833393

申请日：2022-04-04

Applicant: Applied Materials, Inc.

Designer： Rohan Vijay Rane ,  Xue Yang Chang ,  Timothy Joseph Franklin ,  Daniel Sang Byun

Abstract: FIG. 1 is a top, front, right isometric view of a ring for an anti-rotation process kit for a substrate processing chamber, showing our new design.
FIG. 2 is a bottom, left, back isometric view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a front elevation view thereof.
FIG. 6 is a back elevation view thereof.
FIG. 7 is a left elevation view thereof.
FIG. 8 is a right elevation view thereof; and,
FIG. 9 is an enlarged cross-sectional view taken along line 9-9 in FIG. 3 with the enlargements taken from the dashed-dot encircled portions labeled, “FIG. 9,” in FIG. 3.
The even dashed broken lines in FIG. 9 represent unclaimed environment and form no part of the claimed design. The dash-dot lines represent the boundary lines of the enlarged portion view of FIG. 9 shown in FIGS. 3 and 9 and form no part of the claimed design.