公开(公告)号：US20150044947A1

公开(公告)日：2015-02-12

申请号：US14341419

申请日：2014-07-25

Applicant: Applied Materials, Inc.

Inventor： William Ming-Ye LU ,  Wendell Glen BOYD, JR. ,  Stacy MEYER

IPC: B24B37/04 ,  B24B41/06 ,  H01L21/683 ,  B24B37/32

CPC classification number: B24B37/044 ,  B24B37/32 ,  H01L21/6831

Abstract: Embodiments of the present invention provide a polishing ring assembly suitable for polishing an electrostatic chuck and method of using the same. In one embodiment, the polishing ring assembly has a retaining ring assembly and an electrostatic chuck fixture. The retaining ring assembly includes an inner diameter and a top surface, a plurality of outer drive rings wherein the plurality of outer drive rings are placed on the top surface of the ceramic retaining ring. The electrostatic chuck fixture includes an electrostatic chuck drive plate adjacent to the inner diameter of in the ceramic retaining ring. The electrostatic chuck drive plate has a lock to secure retaining ring assembly with the electrostatic chuck fixture without transferring the weight from one assembly over to the other through the locking mechanism.

Abstract translation: 本发明的实施例提供一种适于抛光静电卡盘的抛光环组件及其使用方法。 在一个实施例中，抛光环组件具有保持环组件和静电吸盘夹具。 保持环组件包括内径和顶表面，多个外驱动环，其中多个外驱动环被放置在陶瓷保持环的顶表面上。 静电吸盘夹具包括与陶瓷保持环的内径相邻的静电吸盘驱动板。 静电卡盘驱动板具有锁定，以通过静电卡盘夹具固定保持环组件，而不会通过锁定机构将重量从一个组件转移到另一个组件。

公开(公告)号：US20220088743A1

公开(公告)日：2022-03-24

申请号：US17457423

申请日：2021-12-02

Applicant: Applied Materials, Inc.

Inventor： William Ming-ye LU ,  Wendell Glenn BOYD, JR. ,  Stacy MEYER

IPC: B24B37/04 ,  B24B37/32 ,  H01L21/683

Abstract: Embodiments of the present invention provide a polishing ring assembly suitable for polishing an electrostatic chuck and method of using the same. In one embodiment, the polishing ring assembly has a retaining ring assembly and an electrostatic chuck fixture. The retaining ring assembly includes an inner diameter and a top surface, a plurality of outer drive rings wherein the plurality of outer drive rings are placed on the top surface of the ceramic retaining ring. The electrostatic chuck fixture includes an electrostatic chuck drive plate adjacent to the inner diameter of in the ceramic retaining ring. The electrostatic chuck drive plate has a lock to secure retaining ring assembly with the electrostatic chuck fixture without transferring the weight from one assembly over to the other through the locking mechanism.