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公开(公告)号：US11567417B2
公开(公告)日：2023-01-31
申请号：US17579349
申请日：2022-01-19
Applicant: Applied Materials, Inc.
Inventor： Jing Jiang , Suraj Yadav , Amita Joshi , Vivian Hsu
Abstract: Apparatus and methods of performing nanoimprint lithography using an anti-slip landing ring are provided. In one embodiment, a process chamber for nanoimprint lithography is provided and includes a substrate support and a ring disposed on the substrate support. The ring has a top surface opposite the substrate support, and the top surface has a grid pattern. A bottom surface facing the substrate support has a different pattern compared to the grid pattern.
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