公开(公告)号：US11733533B2

公开(公告)日：2023-08-22

申请号：US17745457

申请日：2022-05-16

Applicant: Applied Materials, Inc.

Inventor： Ludovic Godet ,  Wayne Mcmillan ,  Rutger Meyer Timmerman Thijssen

IPC: G02B27/09 ,  G02B5/18 ,  G03F1/80 ,  G03F7/00

CPC classification number: G02B27/0944 ,  G02B5/18 ,  G02B5/1857 ,  G03F1/80 ,  G03F7/0002

Abstract: The systems and methods discussed herein are for the fabrication of diffraction gratings, such as those gratings used in waveguide combiners. The waveguide combiners discussed herein are fabricated using nanoimprint lithography (NIL) of high-index and low-index materials in combination with and directional etching high-index and low-index materials. The waveguide combiners can be additionally or alternatively formed by the directional etching of transparent substrates. The waveguide combiners that include diffraction gratings discussed herein can be formed directly on permanent transparent substrates. In other examples, the diffraction gratings can be formed on temporary substrates and transferred to a permanent, transparent substrate.