公开(公告)号：US20250043423A1

公开(公告)日：2025-02-06

申请号：US18228549

申请日：2023-07-31

Applicant: Applied Materials, Inc.

Inventor： William Durand ,  Abdullah Zafar ,  Usman Chowdhury ,  Amir Bayati ,  Farzad Houshmand ,  David J. Coumou ,  Kasturi Sarang ,  Kenric Choi

IPC: C23C16/455 ,  G01N21/3504

Abstract: Vapor concentration sensors for deposition process or deposition chamber condition monitoring are described. In an example, a deposition system includes a deposition chamber, a deposition precursor source coupled to an inlet of the deposition chamber, and a non-dispersive infrared (NDIR) vapor concentration sensor between the deposition precursor source and the deposition chamber.