公开(公告)号：US11565489B2

公开(公告)日：2023-01-31

申请号：US16253661

申请日：2019-01-22

Applicant: Applied Materials, Inc.

Inventor： Karl J. Armstrong ,  Jinxin Fu ,  Wilson Banez

IPC: B29D11/00

Abstract: Embodiments described herein relate to methods and materials for optical device fabrication. In one embodiment, a method of fabricating an optical device is provided. The method includes depositing a dielectric film on a substrate, depositing a wetting layer on the dielectric film, and depositing a metal containing film on the wetting layer. In another embodiment, an optical device is provided. The device includes a substrate, a dielectric film deposited on and contacting the substrate, a wetting layer deposited on and contacting the dielectric film, and a metal containing film deposited on and contacting the wetting layer.