公开(公告)号：US20240350962A1

公开(公告)日：2024-10-24

申请号：US18136990

申请日：2023-04-20

Applicant: Applied Materials, Inc.

Inventor： Andrea Leoncini ,  Zhijie Chua

IPC: B01D53/00 ,  B01D8/00 ,  B01D53/75

CPC classification number: B01D53/002 ,  B01D8/00 ,  B01D53/75 ,  B01D2221/14 ,  B01D2257/108 ,  B01D2257/11 ,  B01D2258/0216

Abstract: Chemical precursor recovery systems and methods of recovering and reusing semiconductor manufacturing chemistry are disclosed. The recovery systems include a cold trap inlet line in fluid communication with a plurality of cold traps and a cold trap outlet line. The plurality of cold traps is configured to condense the chemical precursors and are arranged based on semiconductor manufacturing process conditions.