公开(公告)号：US20250157791A1

公开(公告)日：2025-05-15

申请号：US18388821

申请日：2023-11-11

Applicant: Applied Materials, Inc.

Inventor： Yuhui ZHANG ,  Yang YANG ,  Zhimin JIANG ,  Kartik RAMASWAMY ,  Alok RANJAN

IPC: H01J37/32 ,  H01L21/3065

Abstract: An apparatus for generating plasma inductively in a process chamber leverages a radial coil network. In some embodiments, the radial coil network is a planar structure comprising an inner conductor with an open center where at least one RF power source is electrically connected to the inner conductor at a power node, an outer conductor spaced away from and surrounding the inner conductor where at least one ground is electrically connected to the outer conductor at a ground node, a plurality of branch conductors extending from the inner conductor to the outer conductor where the plurality of branch conductors is distributed uniformly in the radial coil network, and a plurality of capacitors where at least one capacitor of the plurality of capacitors is electrically interposed into each branch conductor of the plurality of branch conductors.