公开(公告)号：US20230408423A1

公开(公告)日：2023-12-21

申请号：US17845953

申请日：2022-06-21

Applicant: Applied Materials Israel Ltd.

Inventor： Paz YABBO ,  Boaz DUDOVICH ,  Bhavna GHAI ,  Amir BAR

IPC: G01N21/95 ,  G06N3/08 ,  G06T7/00

CPC classification number: G01N21/9501 ,  G06N3/08 ,  G06T7/0004 ,  G06T2207/30148 ,  G06T2207/20081

Abstract: There is provided a system and method of optimizing an inspection recipe for inspecting a semiconductor specimen. The method includes obtaining test data from a test performed after inspection, the test data indicative of functional defectivity of the specimen with respect to at least one structural feature at a suspected layer; retrieving inspection data of the suspected layer including a set of inspection images and a set of defect maps of the plurality of processing steps of the suspected layer; correlating the test data and the set of defect maps of the suspected layer to identify one or more structural features of the suspected layer with unmatched defectivity; for each of the identified structural features, including at least part of the inspection images corresponding to the structural feature in a training set; and using the training set to train a machine learning (ML) model in the inspection recipe.