公开(公告)号：US20190121933A1

公开(公告)日：2019-04-25

申请号：US16179700

申请日：2018-11-02

Applicant: Applied Materials Israel Ltd.

Inventor： Ron KATZIR ,  Imry KISSOS ,  Lavi SHACHAR ,  Amit BATIKOFF ,  Shaul COHEN ,  Noam ZAC

IPC: G06F17/50

Abstract: One or more metrology objects and one or more metrology operations may be identified. A design-based representation of a first metrology object of the one or more metrology objects may be received. Furthermore, an image-based representation of the first metrology object of the one or more metrology objects may be received where the one or more metrology operations include a first metrology operation associated with the first metrology object that is to be performed on the image-based representation of the first metrology object. The design-based representation of the first metrology object may be mapped with the image-based representation of the first metrology object. The first metrology operation may be performed based on the mapping.