公开(公告)号：US20160349742A1

公开(公告)日：2016-12-01

申请号：US14727800

申请日：2015-06-01

Applicant: Applied Materials Israel Ltd.

Inventor： Michele DALLA-TORRE ,  Amit BATIKOFF ,  Efrat ROZENMAN ,  Ron KATZIR ,  Imry KISSOS

IPC: G05B19/418

Abstract: There are provided a method of generating an inspection recipe usable for inspecting an inspection area of a specimen and a recipe generating unit. The recipe generating unit is configured: upon obtaining design data informative of design structural elements comprised in a design PoI corresponding to the at least one PoI, to provide global segmentation of a test image captured by an inspection tool unit from the inspection area and comprising at least one test PoI of substantially the same design as the at least one PoI, thereby to obtain segmented structural elements comprised in the test PoI and segmentation configuration data; to associate the segmented structural elements comprised in the test PoI with the design structural elements comprised in the design PoI, thereby to obtain design association data; and to generate an inspection recipe comprising, at least, segmentation configuration data and design association data.

Abstract translation: 提供了一种生成可用于检查样本和食谱生成单元的检查区域的检查配方的方法。 配方生成单元被配置为：在获得包括在与至少一个PoI对应的设计PoI中的设计结构元素的设计数据时，提供由检查工具单元从检查区域捕获的测试图像的全局分割，并且包括 至少一个测试PoI与至少一个PoI基本上相同的设计，从而获得包含在测试PoI和分割配置数据中的分段结构元素; 将包含在测试PoI中的分段结构元素与设计PoI中包含的设计结构元素相关联，从而获得设计关联数据; 并且生成至少包括分割配置数据和设计关联数据的检查配方。

公开(公告)号：US20190121933A1

公开(公告)日：2019-04-25

申请号：US16179700

申请日：2018-11-02

Applicant: Applied Materials Israel Ltd.

Inventor： Ron KATZIR ,  Imry KISSOS ,  Lavi SHACHAR ,  Amit BATIKOFF ,  Shaul COHEN ,  Noam ZAC

IPC: G06F17/50

Abstract: One or more metrology objects and one or more metrology operations may be identified. A design-based representation of a first metrology object of the one or more metrology objects may be received. Furthermore, an image-based representation of the first metrology object of the one or more metrology objects may be received where the one or more metrology operations include a first metrology operation associated with the first metrology object that is to be performed on the image-based representation of the first metrology object. The design-based representation of the first metrology object may be mapped with the image-based representation of the first metrology object. The first metrology operation may be performed based on the mapping.

公开(公告)号：US20160350905A1

公开(公告)日：2016-12-01

申请号：US14728495

申请日：2015-06-02

Applicant: Applied Materials Israel Ltd.

Inventor： Michele DALLA-TORRE ,  Amit BATIKOFF ,  Efrat ROZENMAN ,  Ron KATZIR ,  Imry KISSOS

IPC: G06T7/00 ,  G06K9/62

CPC classification number: G05B19/41875 ,  G05B2219/37224 ,  G05B2219/45031 ,  G06K9/6202 ,  G06T7/0004 ,  G06T7/001 ,  G06T2200/24 ,  G06T2207/30148 ,  Y02P90/265

Abstract: There are provided a method of inspecting the inspection area and an inspection system thereof. The inspection system comprises an inspection control unit operatively coupled to an inspection tool unit and to a recipe generating unit. The inspection control unit is configured to obtain the design data and the inspection recipe; to provide local segmentation of at least one inspection PoI comprised in an inspection image captured from the inspection area by the inspection tool unit, thereby obtaining inspection structural elements comprised in the at least one inspection PoI, the local segmentation is provided using segmentation configuration data specified in the inspection recipe; to identify one or more target structural elements and design structural elements corresponding thereto, identifying is provided using design association data specified in the inspection recipe; and to enable metrology measurements for the one or more target structural elements using the identified design structural elements.

Abstract translation: 提供检查检查区域的方法及其检查系统。 检查系统包括可操作地联接到检查工具单元和配方生成单元的检查控制单元。 检查控制单元被配置为获得设计数据和检查配方; 提供包括在由检查工具单元从检查区域捕获的检查图像中的至少一个检查PoI的局部分割，从而获得包括在至少一个检查PoI中的检查结构元件，使用指定的分割配置数据提供局部分割 在检验配方中; 识别一个或多个目标结构元件并设计与之对应的结构元件，使用在检查配方中指定的设计关联数据来提供识别; 并且使用所识别的设计结构元件来对一个或多个目标结构元件进行度量测量。

公开(公告)号：US20180268099A1

公开(公告)日：2018-09-20

申请号：US15698585

申请日：2017-09-07

Applicant: Applied Materials Israel Ltd.

Inventor： Ron KATZIR ,  Imry KISSOS ,  Lavi Jacov SHACHAR ,  Amit BATIKOFF ,  Shaul COHEN ,  Noam ZAC

IPC: G06F17/50 ,  G06T7/00 ,  G06T7/73 ,  G06T7/33 ,  G06T3/00

CPC classification number: G06F17/5081 ,  G06T3/0068 ,  G06T7/0006 ,  G06T7/001 ,  G06T7/337 ,  G06T7/74 ,  G06T2200/24 ,  G06T2207/30148

Abstract: There are provided system and method of performing metrology operations related to a specimen. The method comprises: generating an examination recipe in accordance with a metrology application, the examination recipe specifying one or more metrology objects and one or more metrology operations related to the metrology application; obtaining an image-based representation of the specimen and a design-based representation of the specimen; mapping between the design-based representation of at least first metrology object and the image-based representation of at least first metrology object; and performing at least first metrology operation of the one or more metrology operations according to the examination recipe using the mapping, the at least first metrology operation specified as related to the at least first metrology object and to be performed on at least the image-based representation of the specimen.

公开(公告)号：US20180268098A1

公开(公告)日：2018-09-20

申请号：US15460078

申请日：2017-03-15

Applicant: Applied Materials Israel Ltd.

Inventor： Ron KATZIR ,  Imry KISSOS ,  Lavi Jacov SHACHAR ,  Amit BATIKOFF ,  Shaul COHEN ,  Noam ZAC

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G06F2217/12

Abstract: There are provided system and method of performing metrology operations related to a specimen. The method comprises: accommodating definitions of metrology objects and metrology operations, at least one of the group consisting of the metrology objects and the metrology operations being defined using design data; accommodating a design-based representation and an image-based representation of the specimen, the design-based representation of the specimen comprising design-based representation of at least first metrology object, the image-based representation of the specimen comprising image-based representation of the at least first metrology object, the metrology operations including at least first metrology operation defined as related to the at least first metrology object and performed on at least the image-based representation of the specimen; mapping between the design-based representation and the image-based representation of the at least first metrology object; and performing the at least first metrology operation according to definition thereof using the mapping.