公开(公告)号：US20250124307A1

公开(公告)日：2025-04-17

申请号：US18488888

申请日：2023-10-17

Applicant: Applied Materials Israel Ltd.

Inventor： Aviad YAHALOM ,  Chen RAICH ,  Karen POMERANZ ,  Lior KATZ ,  Marcelo BACHER ,  Tamir DUHOVNY

IPC: G06N5/022

Abstract: There is provided a system and method of defect examination on a semiconductor specimen. The method comprises: obtaining an inspection dataset informative of a group of defect candidates and attributes thereof resulting from examining the specimen by an inspection tool; classifying, by a classifier, the group of defect candidates into a plurality of defect classes such that each defect candidate is associated with a respective defect class; and ranking, by a decision model, the group of defect candidates into a total order using a sorting rule. Each defect candidate is associated with a distinct ranking in the total order representative of the likelihood of the defect candidate being a defect of interest (DOI). The decision model is previously trained to learn the sorting rule pertaining to the plurality of defect classes associated with the group of defect candidates and a series of attributes in the inspection data.