公开(公告)号：US20240428395A1

公开(公告)日：2024-12-26

申请号：US18214231

申请日：2023-06-26

Applicant: Applied Materials Israel Ltd.

Inventor： Rafael BISTRITZER ,  Ilan BEN-HARUSH ,  Mor BARAM ,  Tal BEN-SHLOMO ,  Nir BILLFELD (LEVI) ,  Noam TEOMIM

IPC: G06T7/00 ,  G06T7/60

Abstract: There is provided a metrology system and method. The method includes obtaining a set of tool parameters selected from multiple tool parameters characterizing the examination tool, varying a value of each tool parameter from the set a number of times, giving rise to a plurality of tool settings corresponding to a plurality of combinations of varying values of the set of tool parameters, configuring an examination tool with each given tool setting of the plurality of tool settings; and in response to receiving, from the examination tool, a plurality of sets of images corresponding to the plurality of tool settings and representing expected tool variations over time in a single tool or between different tools, optimizing a metrology algorithm using the plurality of sets of images so as to meet at least one metrology metric including tool matching.