公开(公告)号：US10275872B2

公开(公告)日：2019-04-30

申请号：US15685995

申请日：2017-08-24

Applicant: Applied Materials Israel Ltd.

Inventor： Karen Pomeranz ,  Eyal Neistein ,  Vivek Balasubramanian ,  Moshe Amzaleg ,  Eyal Bassa

IPC: G06K9/00 ,  G06T7/00

Abstract: There are provided system and method of detecting repeating defects on a specimen, the specimen obtained by printing two or more mask fields thereon, each of mask field comprising multiple dies, the method comprising: scanning the specimen to capture a plurality of first images from first dies located at the same position in the mask fields, and, for each first image, capture two or more second images from dies located in different positions from the first dies; generating a plurality of third images corresponding to the plurality of first images; generating, an average third image constituted by pixels with values computed as accumulated pixel values of corresponding pixels in the plurality of third images divided by the number of the two or more mask fields; and determining presence of repeating defects on the specimen based on the average third image and a predefined defect threshold.

公开(公告)号：US20190066292A1

公开(公告)日：2019-02-28

申请号：US15685995

申请日：2017-08-24

Applicant: Applied Materials Israel Ltd.

Inventor： Karen Pomeranz ,  Eyal Neistein ,  Vivek Balasubramanian ,  Moshe AMZALEG ,  Eyal BASSA

IPC: G06T7/00

Abstract: There are provided system and method of detecting repeating defects on a specimen, the specimen obtained by printing two or more mask fields thereon, each of mask field comprising multiple dies, the method comprising: scanning the specimen to capture a plurality of first images from first dies located at the same position in the mask fields, and, for each first image, capture two or more second images from dies located in different positions from the first dies; generating a plurality of third images corresponding to the plurality of first images; generating, an average third image constituted by pixels with values computed as accumulated pixel values of corresponding pixels in the plurality of third images divided by the number of the two or more mask fields; and determining presence of repeating defects on the specimen based on the average third image and a predefined defect threshold.