公开(公告)号：US12054821B2

公开(公告)日：2024-08-06

申请号：US16770850

申请日：2018-12-11

Applicant: ArcelorMittal

Inventor： Eric Silberberg ,  Bruno Schmitz ,  Sergio Pace ,  Remy Bonnemann ,  Didier Marneffe

IPC: C23C14/56 ,  C23C14/14 ,  C23C14/24

CPC classification number: C23C14/24 ,  C23C14/14 ,  C23C14/562 ,  C23C14/564

Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including—a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:



a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors,
a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.

公开(公告)号：US12129542B2

公开(公告)日：2024-10-29

申请号：US16972176

申请日：2019-06-11

Applicant: ArcelorMittal

Inventor： Sergio Pace ,  Bruno Schmitz ,  Didier Marneffe ,  Eric Silberberg

IPC: C23C14/56 ,  C23C14/24

CPC classification number: C23C14/562 ,  C23C14/243

Abstract: A vacuum deposition facility 1 for continuously depositing, on a running substrate S, coatings formed from metal or metal alloy, the facility including an evaporation crucible 4 suited to supply metal or metal alloy vapor and including an evaporation pipe 7, a deposition chamber 2 suited to have the substrate S run through along a given path P and a vapor jet coater 3 linking the evaporation pipe to the deposition chamber, wherein the vapor jet coater further includes a repartition chamber 31 including at least one reheater 33 positioned within the repartition chamber and a vapor outlet orifice 32 including a base opening linking the vapor outlet orifice to the repartition chamber, a top opening through which the vapor can exit in the deposition chamber and two sides converging toward each other in the direction of the top opening.

公开(公告)号：US12139784B2

公开(公告)日：2024-11-12

申请号：US16770872

申请日：2018-12-11

Applicant: ArcelorMittal

Inventor： Eric Silberberg ,  Bruno Schmitz ,  Sergio Pace ,  Remy Bonnemann ,  Didier Marneffe

IPC: C23C14/24 ,  C23C14/56

Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and including: a central casing including a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors, the passage linking the central casing to the vapor trap including at least one thermal connector extending at least from the inner walls of the central casing to the inner walls of the vapor trap.