公开(公告)号：US20090027642A1

公开(公告)日：2009-01-29

申请号：US12232967

申请日：2008-09-26

申请人： Arjen Boogaard ,  Timotheus Franciscus Sengers ,  Wilhelmus Sebastianus Marcus Maria Ketelaars ,  Carolus Ida Maria Spee

发明人： Arjen Boogaard ,  Timotheus Franciscus Sengers ,  Wilhelmus Sebastianus Marcus Maria Ketelaars ,  Carolus Ida Maria Spee

IPC分类号： G03B27/42

CPC分类号： G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

摘要： An exposure apparatus includes a radiation system configured to supply a projection beam of radiation, and a patterning device configured to pattern the projection beam according to a desired pattern. The apparatus includes a substrate table having an area configured to support a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. At least a part of the apparatus that during use of the apparatus is exposed to radiation is coated with a coating. The coating includes a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof.

摘要翻译： 曝光装置包括被配置为提供投影射线束的辐射系统，以及被配置为根据期望的图案对投影光束进行图案化的图案形成装置。 该装置包括具有配置为支撑基板的区域的基板台，以及配置成将图案化的光束投影到基板的目标部分上的投影系统。 在使用设备暴露于辐射的过程中，装置的至少一部分涂覆有涂层。 涂层包括金属氧化物或光催化剂，或半导体，或其任何组合。

公开(公告)号：US20060175558A1

公开(公告)日：2006-08-10

申请号：US11051477

申请日：2005-02-07

申请人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

发明人： Levinus Bakker ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Johannes Leonardus Franken ,  Arnoud Wassink ,  Paul Antonius Brom

IPC分类号： G03B7/20

CPC分类号： G03F7/70175 ,  G03F7/70916

摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

摘要翻译： 用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。 光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。 辐射收集器被周向壳体和气体屏障包围。 入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。

公开(公告)号：US20060115771A1

公开(公告)日：2006-06-01

申请号：US11239479

申请日：2005-09-30

申请人： Maarten Marinus Wilhelmus Van Herpen ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Derk Jan Klunder

发明人： Maarten Marinus Wilhelmus Van Herpen ,  Vadim Banine ,  Johannes Josephina Moors ,  Carolus Ida Maria Spee ,  Derk Jan Klunder

IPC分类号： G03C5/00

CPC分类号： B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

公开(公告)号：US20050008978A1

公开(公告)日：2005-01-13

申请号：US10840508

申请日：2004-05-07

申请人： Johannes Adrianus Antonius Dams ,  Mark Kroon ,  Harm-Jan Voorma ,  Carolus Ida Maria Spee

发明人： Johannes Adrianus Antonius Dams ,  Mark Kroon ,  Harm-Jan Voorma ,  Carolus Ida Maria Spee

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03C5/00

CPC分类号： G03F7/70983 ,  G03F7/70916

摘要： A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.

摘要翻译： 公开了一种制备用于光刻设备的真空室中的组件的方法。 该方法包括用非金属材料涂覆该组分。 该方法还可以包括处理涂层以使涂层硬化。 优选地，涂层材料是氢倍半硅氧烷（HSQ），其可以通过喷涂，刷涂或纺丝施加，并且可以通过加热或通过用电子束的照射进行处理。 所产生的组分在经受真空环境时强烈地减少了水和烃的除气。