DIFFUSION BARRIER COATED SUBSTRATES AND METHODS OF MAKING THE SAME
    1.
    发明申请
    DIFFUSION BARRIER COATED SUBSTRATES AND METHODS OF MAKING THE SAME 有权
    扩散阻挡层涂覆基板及其制造方法

    公开(公告)号:US20130243940A1

    公开(公告)日:2013-09-19

    申请号:US13873156

    申请日:2013-04-29

    IPC分类号: H01F5/00 H01Q7/00 H01F41/04

    摘要: Devices on a diffusion barrier coated metal substrates, and methods of making the same are disclosed. The devices include a metal substrate, a diffusion barrier layer on the metal substrate, one or more insulator layers on the diffusion barrier layer, and an antenna and/or inductor on the one or more insulator layer(s). The method includes forming a diffusion barrier layer on the metal substrate, forming one or more insulator layers on the diffusion barrier layer; and forming an antenna and/or inductor on an uppermost one of the insulator layer(s). The antenna and/or inductor is electrically connected to at least one of the diffusion barrier layer and/or the metal substrate. Such diffusion barrier coated substrates prevent diffusion of metal atoms from the metal substrate into device layers formed thereon.

    摘要翻译: 公开了扩散阻挡涂层金属基板上的器件及其制造方法。 这些器件包括金属衬底,金属衬底上的扩散阻挡层,扩散阻挡层上的一个或多个绝缘体层,以及一个或多个绝缘体层上的天线和/或电感器。 该方法包括在金属基板上形成扩散阻挡层,在扩散阻挡层上形成一个或多个绝缘体层; 以及在所述绝缘体层的最上面形成天线和/或电感器。 天线和/或电感器电连接到扩散阻挡层和/或金属衬底中的至少一个。 这种扩散阻挡涂层的基底防止金属原子从金属基底扩散到其上形成的器件层。