专利检索 ap:("Atotech Deutschland GmbH") AND inv:"Jun WU" 第 1 页

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发明申请
PYRIDINIUM COMPOUNDS, A SYNTHESIS METHOD THEREFOR, METAL OR METAL ALLOY PLATING BATHS CONTAINING SAID PYRIDINIUM COMPOUNDS AND A METHOD FOR USE OF SAID METAL OR METAL ALLOY PLATING BATHS 审中-公开

公开(公告)号：US20200231565A1

公开(公告)日：2020-07-23

申请号：US16483053

申请日：2018-01-26

申请人： Atotech Deutschland GmbH

发明人： Rangarajan JAGANNATHAN , James ADOLF , Jun WU , Lars KOHLMANN , Heiko BRUNNER

IPC分类号： C07D401/12 , C25D3/58 , C25D7/12 , C25D3/38

摘要： The present invention concerns pyridinium compounds, a synthesis method for their preparation, metal or metal alloy plating baths containing said pyridinium compounds and a method for use of said metal or metal alloy plating baths.The plating baths are particularly suitable for use in filling of recessed structures in the electronics and semiconductor industry including dual damascene applications.