公开(公告)号：US11183365B2

公开(公告)日：2021-11-23

申请号：US16850066

申请日：2020-04-16

Applicant: Axcelis Technologies, Inc.

Inventor： Joshua Max Abeshaus ,  Neil Bassom ,  Camilla Lambert ,  Caleb Wisch ,  Kyle Hinds ,  Caleb Bell

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/32

Abstract: An ion source for an ion implantation system has a plurality of arc chambers. The ion source forms an ion beam from a respective one of the plurality of arc chambers based on a position of the respective one of the plurality of arc chambers with respect to a beamline. The arc chambers are coupled to a carrousel that translates or rotates the respective one of the plurality of arc chambers to a beamline position associated with the beamline. One or more of the plurality of arc chambers can have at least one unique feature, or two or more of the plurality of arc chambers can be generally identical to one another.

公开(公告)号：US20200335302A1

公开(公告)日：2020-10-22

申请号：US16850066

申请日：2020-04-16

Applicant: Axcelis Technologies, Inc.

Inventor： Joshua Max Abeshaus ,  Neil Bassom ,  Camilla Lambert ,  Caleb Wisch ,  Kyle Hinds ,  Caleb Bell

IPC: H01J37/317 ,  H01J37/08 ,  H01J37/32

Abstract: An ion source for an ion implantation system has a plurality of arc chambers. The ion source forms an ion beam from a respective one of the plurality of arc chambers based on a position of the respective one of the plurality of arc chambers with respect to a beamline. The arc chambers are coupled to a carrousel that translates or rotates the respective one of the plurality of arc chambers to a beamline position associated with the beamline. One or more of the plurality of arc chambers can have at least one unique feature, or two or more of the plurality of arc chambers can be generally identical to one another.