PROBE STATION FOR ON-WAFER-MEASUREMENT UNDER EMI-SHIELDING
    1.
    发明申请
    PROBE STATION FOR ON-WAFER-MEASUREMENT UNDER EMI-SHIELDING 有权
    探测器在EMI屏蔽下进行测量

    公开(公告)号:US20110227602A1

    公开(公告)日:2011-09-22

    申请号:US12818442

    申请日:2010-06-18

    IPC分类号: G01R31/26

    CPC分类号: G01R31/2886 G01R1/18

    摘要: An arrangement is provided for testing DUTs with a chuck that has a support surface for supporting of a DUT as well as for supplying the support surface with a defined potential, or for connecting the DUT. The arrangement further includes a positioning device for positioning the chuck as well as an electromagnetic shielding housing enclosing at least the chuck. Inside the housing and adjacent to the chuck, a signal preamplifier is arranged whose signal port facing the chuck is electrically connected with the support surface, wherein the signal preamplifier is moveable together with the chuck by the positioning device in a way that it holds its position constant relative to the chuck during positioning. The signal preamplifier is connected to a measurement unit outside of the housing via a measurement cable.

    摘要翻译: 提供了一种用于使用具有用于支撑DUT的支撑表面以及用于向支撑表面提供限定电位或用于连接DUT的卡盘来测试DUT的布置。 该装置还包括用于定位卡盘的定位装置以及至少包围卡盘的电磁屏蔽壳体。 在壳体内部和卡盘附近,布置了一个信号前置放大器,其信号端口面向卡盘与支撑表面电连接,其中信号前置放大器可以通过定位装置与卡盘一起移动,使其保持其位置 在定位期间相对于卡盘是恒定的。 信号前置放大器通过测量电缆连接到壳体外部的测量单元。

    METHOD FOR DETERMINATION OF ELECTRICAL PROPERTIES OF ELECTRONIC COMPONETS AND METHOD FOR CALIBRATION OF A MEASURING UNIT
    2.
    发明申请
    METHOD FOR DETERMINATION OF ELECTRICAL PROPERTIES OF ELECTRONIC COMPONETS AND METHOD FOR CALIBRATION OF A MEASURING UNIT 审中-公开
    用于确定电子元件的电气特性的方法和测量单元的校准方法

    公开(公告)号:US20090314051A1

    公开(公告)日:2009-12-24

    申请号:US12488702

    申请日:2009-06-22

    IPC分类号: G01D18/00 G01R19/00

    摘要: In a method for calibration of a measurement unit for determination of electrical properties of electronic components using at least one planar calibration standard, an electrical measurement quantity is measured at two different temperatures. The electrical property of the calibration standard is known at at least one temperature or is to be determined by calculation. A temperature coefficient is determined from both measured quantities, which describes the relative change of the electrical property of the calibration standard accompanying the temperature change and with which the electrical property of the calibration standard is determined at a measurement temperature. From the change in electrical property, an error coefficient of the measurement unit is determined. A method is also provided for determination of an electrical property of an electronic component, using the calibration method.

    摘要翻译: 在使用至少一个平面校准标准来确定电子元件的电特性的测量单元的校准方法中,在两个不同温度下测量电测量量。 校准标准品的电学性质在至少一个温度下是已知的,或通过计算来确定。 温度系数由两个测量量确定,其描述伴随温度变化的校正标准的电性能的相对变化,并且在测量温度下确定校准标准的电性能。 根据电气特性的变化,确定测定单元的误差系数。 还提供了一种用于使用校准方法确定电子部件的电特性的方法。

    CHUCK FOR SUPPORTING AND RETAINING A TEST SUBSTRATE AND A CALIBRATION SUBSTRATE
    3.
    发明申请
    CHUCK FOR SUPPORTING AND RETAINING A TEST SUBSTRATE AND A CALIBRATION SUBSTRATE 有权
    支持和保留测试基板和校准基板

    公开(公告)号:US20090315581A1

    公开(公告)日:2009-12-24

    申请号:US12489913

    申请日:2009-06-23

    IPC分类号: G01R31/02

    CPC分类号: G01R31/2886

    摘要: A chuck for supporting and retaining a test substrate includes a device for supporting and retaining a calibration substrate. The chuck comprises a first support surface for supporting a test substrate and a second support surface, which is laterally offset to the first support surface, for supporting a calibration substrate The calibration substrate has planar calibration standards for calibration of a measuring unit of a prober, and dielectric material or air situated below the calibration substrate at least in the area of the calibration standard. In order to be able to take the actual thermal conditions on the test substrate and in particular also on known and unknown calibration standards and thus the thermal influence on the electrical behavior of the calibration standard used into consideration, the second support surface is equipped for temperature control of the calibration substrate.

    摘要翻译: 用于支撑和保持测试基板的卡盘包括用于支撑和保持校准基板的装置。 卡盘包括用于支撑测试基板的第一支撑表面和横向偏移到第一支撑表面的用于支撑校准基板的第二支撑表面。校准基板具有用于校准探测器的测量单元的平面校准标准, 以及至少在校准标准区域中位于校准基板下方的电介质材料或空气。 为了能够在测试基板上获取实际的热条件,特别是在已知和未知的校准标准上,因此考虑到所使用的校准标准的电气行为的热影响,第二支撑表面装备有温度 校准基板的控制。

    PROCESS FOR MEASURING THE IMPEDANCE OF ELECTRONIC CIRCUITS
    4.
    发明申请
    PROCESS FOR MEASURING THE IMPEDANCE OF ELECTRONIC CIRCUITS 审中-公开
    测量电子电路阻抗的方法

    公开(公告)号:US20100106439A1

    公开(公告)日:2010-04-29

    申请号:US12609155

    申请日:2009-10-30

    IPC分类号: G01R27/00 G01R27/28

    CPC分类号: G01R27/04

    摘要: In a method for measurement of impedance of electronic circuits, an input of the electronic circuit is acted upon by a high-frequency ac voltage with a measurement frequency f as a test signal and, from the reaction of the circuit to the test signal, the impedance Z of the circuit is determined. A parameter S, which represents the value S = Z - Z 0 Z + Z 0 at a stipulated reference impedance Z0, is produced by an analyzer with a reference impedance Z0, and from this parameter S the impedance Z is determined. To minimize the error in measuring the impedances by determining parameter S, the measurement frequency f is set so that a minimal error ΔZ is produced for Z.

    摘要翻译: 在电子电路的阻抗测定方法中,以测量频率f为测试信号的高频交流电压对电子电路的输入进行动作,从电路与测试信号的反应, 确定电路的阻抗Z。 在规定的基准阻抗Z0下,表示值S = Z-Z 0 Z + Z 0的参数S由具有参考阻抗Z0的分析器产生,并且从该参数S确定阻抗Z。 为了通过确定参数S来最小化测量阻抗的误差,测量频率f被设置为使Z产生最小误差&Dgr; Z。